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Title Computer Simulation of Temperature Profiles for DC Pulse Plasma Jet Modification of Co-based Plasma Detonation Coatings
Authors Alontseva, D.L.
Krasavin, A.L.
Russakova, A.V.
Sadvakasova, N.
ORCID
Keywords Temperature Profile
Mathematical Modeling
High-Speed Plasma Jet
Protective Powder Coatings
Type Conference Papers
Date of Issue 2013
URI http://essuir.sumdu.edu.ua/handle/123456789/35117
Publisher Sumy State University
License
Citation Computer Simulation of Temperature Profiles for DC Pulse Plasma Jet Modification of Co-based Plasma Detonation Coatings [Текст] / D.L. Alontseva, A.L. Krasavin, A.V. Russakova, N. Sadvakasova // Nanomaterials: Applications & Properties (NAP-2013): 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03PISERE03
Abstract This paper deals with locating the temperature field in a coated plate heated by a moving heat source. The relevance of this problem lies in the challenge of selecting the optimum exposure modes for modifying irradiation of protective powder coatings deposited by a high-speed plasma jet. Based on a number of ex-perimental studies of the structure and properties of these coatings before and after additional plasma jet irradiation, we concluded that it is necessary to model the distribution of temperature during irradiation in order to justify the choice of irradiation parameters such as the source power density and speed. The val-ues and the distribution of temperature in depth from the surface heated by the source play a crucial role in reducing the particles of strengthening phases from the solid solution and accelerating diffusion pro-cesses between the coating and the substrate. Comparing the experimental data with the calculations of the temperature profile, we can offer the best exposure modes, which do not lead to excessive heating of the coating, but result in changes in the phase composition and the improvement of adhesion of the coating with the substrate by accelerating the diffusion processes between the coating and the substrate. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35117
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