Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation

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Title	Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation
Authors	Redko, S.V. Chubenko, E.B. Klyshko, A.A.
ORCID
Keywords	Porous silicon Template Nanocomposites
Type	Conference Papers
Date of Issue	2012
URI	http://essuir.sumdu.edu.ua/handle/123456789/35088
Publisher	Sumy State University
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Citation	Redko, S. V. Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation / S. V. Redko, E. B. Chubenko, A. A. Klyshko // Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No3. - 03CNN10
Abstract	The paper describes the fabrication process of templates with high aspect ratio suitable for formation of nanomposites with enhanced anisotropy. The templates are thick ordered porous silicon layers formed with the pulsed galvanostatic mode. Characteristic feature of the developed mode is a short reversed polarity pulse of certain amplitude. In the present paper the achieved thickness of porous silicon templates is 50 m with pore diameter 80 nm. The aspect ratio of those structures 1:600. The maximum thickness of formed silicon layers is not principally limited allowing obtaining nanostructures with even higher aspect ratio. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35088
Appears in Collections:	Наукові видання (ЕлІТ)